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The sputtering technology of MF magnetron coating equipment is characterized by stable sputtering, dielectric film deposition rate is much higher than general DC magnetron sputtering, and the film bonding force is further enhanced, which is the mainstream of today's magnetron technology.
This equipment has no waste gas, waste water and dust, and it is an excellent large-scale production environment-friendly equipment. The form can be a vertical double-opening door structure, or can be in the form of a production line, and can be customized according to different requirements.
It can be used for planar targets, cylindrical targets, twin targets, targets and other forms of intermediate frequency sputtering target structures and layouts. This type of equipment is widely used in watch, strap, mobile phone case, golf equipment, hardware, tableware and other decorative plating such as TiN, TiC, TICN, TiAIN, CrN.
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